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Layout or Design Rules:
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Design rules specify geometric constraints on the layout artwork.
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Provide a communication channel between the IC designer and the fabrication process engineer.
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Objective:
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To obtain a circuit with optimum yield.
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To minimize the area of the circuit.
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To provide long term reliability of the circuit.
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Design rules represent the best compromise between performance and yield:
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More conservative rules increase yield.
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More aggressive rules increase performance.
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Design rules represent a
tolerance
that ensures high probability of correct fabrication - rather than a hard boundary between correct and incorrect fabrication.
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Layout or Design Rules:
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Two approaches to describing design rules:
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Lambda-based rules: Allow first order scaling by linearizing the resolution of the complete wafer implementation.
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To move a design from 4 micron to 2 micron, simply reduce the value of lambda.
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Worked well for 4 micron processes down to 1.2 micron processes.
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However, in general, processes rarely shrink uniformly.
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Probably not sufficient for submicron processes.
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Micron rules: List of minimum feature sizes and spacings for all masks, e.g., 3.25 microns for contact-poly-contact (transistor pitch) and 2.75 micron metal 1 contact-to-contact pitch.
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Micron rules can result in as much as a 50% size reduction over lambda rules.
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Normal style for industry.
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Inverter layout alternatives:
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All complementary gates may be designed using a single row of n-transistors above or below a single row of p-transistors.
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The right side shows a "stacked layout".
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Works well for cascaded gates.
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"Line of diffusion" rule:
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Transistors form a line of diffusion intersected by poly.
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Diffusion will be unbroken if identically labeled Euler paths can be found for the p and n trees:
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Both the control signal and its complement have to be routed.
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It is important to equalize delays along these control lines.
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CMOS Standard Cell Design:
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The cells are characterized by some geometric regularity such as a fixed cell height.
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A library of common gates such as NAND, NOR, XOR, INV, etc. that can be used by automatic place and route tools.